Browse Prior Art Database

Helium/Cadmium Laser Assisted Deposition of Chromium for Optical Lithographic Mask Repair

IP.com Disclosure Number: IPCOM000041036D
Original Publication Date: 1987-May-01
Included in the Prior Art Database: 2005-Feb-02
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Jackson, RL: AUTHOR

Abstract

Cr(CO)6 vapor is photodissociated by means of a cw uv laser to cause photochemical deposition of chromium. This process is useful in the repair of optical lithographic masks, with the deposition taking place onto a clear defect site. A sealed- cavity Helium/Cadmium laser operating at 325 nm is used. Ex- cellent reproducibility, deposit shape, adhesion and process control have been achieved.

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Helium/Cadmium Laser Assisted Deposition of Chromium for Optical Lithographic Mask Repair

Cr(CO)6 vapor is photodissociated by means of a cw uv laser to cause photochemical deposition of chromium. This process is useful in the repair of optical lithographic masks, with the deposition taking place onto a clear defect site. A sealed- cavity Helium/Cadmium laser operating at 325 nm is used. Ex- cellent reproducibility, deposit shape, adhesion and process control have been achieved.

Disclosed anonymously

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