Browse Prior Art Database

Real Time Control of Photo Exposure Dose

IP.com Disclosure Number: IPCOM000041220D
Original Publication Date: 1987-Dec-01
Included in the Prior Art Database: 2005-Feb-02
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Chappelow, RE: AUTHOR [+2]

Abstract

Photo exposure dose is adjusted and controlled for every exposure to assure correct exposure of photoresist that may have a sensitivity to such factors as: time delay after a sensitizing process, barometric pressure, humidity, etc.

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Real Time Control of Photo Exposure Dose

Photo exposure dose is adjusted and controlled for every exposure to assure correct exposure of photoresist that may have a sensitivity to such factors as: time delay after a sensitizing process, barometric pressure, humidity, etc.

As image dimensions required in photo-processing of semiconductors approach limits of photo resolution, image size sensitivity to correct exposure dose is increasing. Also, new photoresists are being used which require a pre- exposure treatment to activate them. Time delay from activation treatment to exposure becomes an important factor in proper exposure dose. Even the variation in this delay time encountered in step-and- repeat exposure of a single wafer is important. This is shown in the figure.

Disclosed anonymously.

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