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Electrical Alignment Measurement Structure

IP.com Disclosure Number: IPCOM000041487D
Original Publication Date: 1984-Feb-01
Included in the Prior Art Database: 2005-Feb-02
Document File: 2 page(s) / 33K

Publishing Venue

IBM

Related People

Martin, B: AUTHOR [+2]

Abstract

A structure for the electrical measurement of the alignment between a P-diffusion and the contact layer in shown in Figs. 1 and 2. The structure consists of a lateral PNM (P region, N region, metal) with a dual emitter E1, E2 and a single Schottky barrier diode collector C. Alignment is sensed by measuring the individual collector currents from the two emitters wherein structures with misalignment are shown in Figs. 1 and 2. Analytic justification: (Image Omitted) Where: WBD = Design base width W = Displacement due to depletion and lateral diffusion IC = Collector current with inverse base width dependence WCL = Displacement due to misalignment Solving for: The alignment is given by the design base width multiplied by the difference in collector currents and normalized by the sum of the individual collector currents.

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Electrical Alignment Measurement Structure

A structure for the electrical measurement of the alignment between a P- diffusion and the contact layer in shown in Figs. 1 and 2. The structure consists of a lateral PNM (P region, N region, metal) with a dual emitter E1, E2 and a single Schottky barrier diode collector C. Alignment is sensed by measuring the individual collector currents from the two emitters wherein structures with misalignment are shown in Figs. 1 and 2. Analytic justification:

(Image Omitted)

Where: WBD = Design base width W = Displacement due to depletion and lateral diffusion IC = Collector current with inverse base width dependence WCL = Displacement due to misalignment Solving for: The alignment is given by the design base width multiplied by the difference in collector currents and normalized by the sum of the individual collector currents. The sign of the difference indicates the sign of the alignment. By rotating the axis of the structure, alignment can be measured along any attainable axis.

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