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Browse Prior Art Database

Non-Contact Semiconductor Wafer Cleaning

IP.com Disclosure Number: IPCOM000041948D
Original Publication Date: 1984-Mar-01
Included in the Prior Art Database: 2005-Feb-03
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Holley, BR: AUTHOR

Abstract

This is a non-contact final cleaning technique for effectively removing polishing residues and other contaminants following the final polishing operation. It can replace the conventional contact or brush steps that normally use corrosive sodium hypochloride mixtures and detergents. In this process contaminated semiconductor wafers are immersed in RODELENE*, which is normally sold as an etch inhibitor. RODELENE consists of ethyleneglycol, hydrated silica, and aliphatic hydrocarbons. Preferably, the RODELENE liquid is exposed to megasonic agitation to more effectively clean the contaminant from the wafers. * Trademark of Rodel Company, Newark, Delaware.

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Non-Contact Semiconductor Wafer Cleaning

This is a non-contact final cleaning technique for effectively removing polishing residues and other contaminants following the final polishing operation. It can replace the conventional contact or brush steps that normally use corrosive sodium hypochloride mixtures and detergents. In this process contaminated semiconductor wafers are immersed in RODELENE*, which is normally sold as an etch inhibitor. RODELENE consists of ethyleneglycol, hydrated silica, and aliphatic hydrocarbons. Preferably, the RODELENE liquid is exposed to megasonic agitation to more effectively clean the contaminant from the wafers. * Trademark of Rodel Company, Newark, Delaware.

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