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Holder for Substrate and Mask With Compensation for Expansion During Heating Associated With Vacuum Deposition

IP.com Disclosure Number: IPCOM000042102D
Original Publication Date: 1984-Mar-01
Included in the Prior Art Database: 2005-Feb-03
Document File: 2 page(s) / 32K

Publishing Venue

IBM

Related People

Nuccio, C: AUTHOR

Abstract

A ceramic substrate 1 that is to receive a layer of metal by vacuum deposition is mounted in a square substrate locator frame, and a mask 2 is mounted in a separate rectangular mask frame 3. The locator frame has slidable jaws 4 located to face the corners of the substrate frame along the diagonals of the frame. Thus, the jaws tend to position the locator frame with its diagonals located along predetermined lines between opposite pairs of jaws, but the jaws accommodate variations in the size of the substrate. The mask and substrate frames are positioned inside a support that has an inwardly sloping conical surface. At each corner of the frames a pin 5 interconnects the mask frame, one of the jaws, the locator frame, and the conical support.

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Holder for Substrate and Mask With Compensation for Expansion During Heating Associated With Vacuum Deposition

A ceramic substrate 1 that is to receive a layer of metal by vacuum deposition is mounted in a square substrate locator frame, and a mask 2 is mounted in a separate rectangular mask frame 3. The locator frame has slidable jaws 4 located to face the corners of the substrate frame along the diagonals of the frame. Thus, the jaws tend to position the locator frame with its diagonals located along predetermined lines between opposite pairs of jaws, but the jaws accommodate variations in the size of the substrate. The mask and substrate frames are positioned inside a support that has an inwardly sloping conical surface. At each corner of the frames a pin 5 interconnects the mask frame, one of the jaws, the locator frame, and the conical support. The diagonally outer surface of each jaw is shaped to ride on the conical surface of the support. A spring 7 at the lower end of the pin urges the frames downward so that the inwardly sloping conical surface urges the jaws against the substrate locator frame. Thus, the center of the substrate and the center of the mask remain stationary as the substrate and the mask expand and contract. Expansion and contraction of the substrate and the mask take place evenly and predictably.

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