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Browse Prior Art Database

Lithographic Registration Pattern

IP.com Disclosure Number: IPCOM000042464D
Original Publication Date: 1984-May-01
Included in the Prior Art Database: 2005-Feb-03
Document File: 2 page(s) / 46K

Publishing Venue

IBM

Related People

Behringer, U: AUTHOR [+4]

Abstract

The registration pattern used to adjust a lithographic mask to a substrate consists of a periodic arrangement of openings and an additional set of openings enhancing the registration signal only at the nominal position. In electron beam lithography, registration masks are known where the openings have increasing mutual distances in individual groups and where the groups are arranged in a matrix (e.g., U. S. Patent 4,370,554). Fig. 1 shows an example of a registration mask 1 which is used in combination with a corresponding pattern of marks, e.g., edges, on the substrate. The individual groups of openings are designated 2a, 2b, etc. The registration signal obtained by moving a pattern of Fig. 1A over the substrate is shown by curve 20 in Fig. 2 which has a pronounced maximum at the nominal position.

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Lithographic Registration Pattern

The registration pattern used to adjust a lithographic mask to a substrate consists of a periodic arrangement of openings and an additional set of openings enhancing the registration signal only at the nominal position. In electron beam lithography, registration masks are known where the openings have increasing mutual distances in individual groups and where the groups are arranged in a matrix (e.g., U. S. Patent 4,370,554). Fig. 1 shows an example of a registration mask 1 which is used in combination with a corresponding pattern of marks, e.g., edges, on the substrate. The individual groups of openings are designated 2a, 2b, etc. The registration signal obtained by moving a pattern of Fig. 1A over the substrate is shown by curve 20 in Fig. 2 which has a pronounced maximum at the nominal position. The registration signal is derived from the electrons scattered at the registration marks on the substrate or from the electrons absorbed by the substrate. If, however, a part of the registration matrix is destroyed (like the shaded part in Fig. 1A), the registration signal deteriorates seriously (curve 21, Fig. 2), so that the nominal position cannot be determined. Similar problems arise when the marks on the substrate are covered by thick layers of photoresist. However, a unique and clearly discernible signal at the nominal position is obtained if the pattern structure of Fig. 1A is enhanced by a superstructure, adding an additional...