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Plasma Polymerized Films for Archival Optical Storage

IP.com Disclosure Number: IPCOM000042521D
Original Publication Date: 1984-May-01
Included in the Prior Art Database: 2005-Feb-04
Document File: 2 page(s) / 44K

Publishing Venue

IBM

Related People

Ahn, KY: AUTHOR [+2]

Abstract

In optical storage media, a dielectric spacer layer with a low thermal conductivity is made by plasma polymerization of fluorocarbon films from perfluoro-2-butene. Many undesirable properties of solid films, such as SiO2, required for fabrication of trilayers and passivation of monolayer disks are solved by the use of fast-rate, stable, plasma-polymerized, perfluoro-2-butene films. Fig. l is a cross-sectional view of a double-sided disk 9. High-density optical storage media require a passivation layer, an underlayer as a smoothing layer, and, in the case of the trilayer structure in Fig. 1, a dielectric spacer layer 13 with low thermal conductivity. Disk 9 is formed by a pair of disks 11, bonded together by cement film 10.

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Plasma Polymerized Films for Archival Optical Storage

In optical storage media, a dielectric spacer layer with a low thermal conductivity is made by plasma polymerization of fluorocarbon films from perfluoro-2-butene. Many undesirable properties of solid films, such as SiO2, required for fabrication of trilayers and passivation of monolayer disks are solved by the use of fast-rate, stable, plasma-polymerized, perfluoro-2-butene films. Fig. l is a cross-sectional view of a double-sided disk 9. High-density optical storage media require a passivation layer, an underlayer as a smoothing layer, and, in the case of the trilayer structure in Fig. 1, a dielectric spacer layer 13 with low thermal conductivity. Disk 9 is formed by a pair of disks 11, bonded together by cement film 10. A layer 12 of Al (30 nm thick) is coated with the quarter wavelength thick dielectric spacer layer 13, which is coated with an active layer 14 (2.5-8 nm thick) protected by an overcoat 15. Vacuum-deposited SiO2 films have often been used as spacer layers, but have many drawbacks such as slow rate of deposition, high stress in the film, relatively high thermal conductance, etc. A suitable polymer material for applicatons in optical disks is perfluoro-2- butene (C3F6), which can be deposited at a high rate up to 700 ~/min. Fig. 2 shows the deposition rate of perfluoro-2- butene films as a function of RF power. - Stability: Films were deposited onto a variety of substrates, including a Si wafer, Si film, Ti film, NiCrFe...