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Photolith Dry Film Resist Trimmer

IP.com Disclosure Number: IPCOM000042732D
Original Publication Date: 1984-Jun-01
Included in the Prior Art Database: 2005-Feb-04
Document File: 2 page(s) / 41K

Publishing Venue

IBM

Related People

Byrne, TM: AUTHOR [+3]

Abstract

A RISTON* photoresist is introduced into a lift-off process by a lamination technique. Silicon wafers are laminated in a continuous row. See Fig. 1. A layer of RISTON is rolled on top of the silicon wafer, and a protective coat of MYLAR* rolled on top of the RISTON. A layer of MYLAR is also rolled on the bottom side of the silicon wafer. See Fig. 2. The laminated wafers are roughly cut from the strip with a pair of scissors or a sharp knife. The MYLAR-RISTON-MYLAR lamination will be trimmed off to the edge of the silicon wafer. There must be no residue on the edge of the silicon wafer that will affect the registration of the wafer in subsequent operations. To accomplish this, a dry film resist trimmer is used.

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Photolith Dry Film Resist Trimmer

A RISTON* photoresist is introduced into a lift-off process by a lamination technique. Silicon wafers are laminated in a continuous row. See Fig. 1. A layer of RISTON is rolled on top of the silicon wafer, and a protective coat of MYLAR* rolled on top of the RISTON. A layer of MYLAR is also rolled on the bottom side of the silicon wafer. See Fig. 2. The laminated wafers are roughly cut from the strip with a pair of scissors or a sharp knife. The MYLAR-RISTON-MYLAR lamination will be trimmed off to the edge of the silicon wafer. There must be no residue on the edge of the silicon wafer that will affect the registration of the wafer in subsequent operations. To accomplish this, a dry film resist trimmer is used. The trimmer is comprised of a rotary vacuum chuck that holds the wafer approximately on center, and a hot wire filament is used to burn off the excess MYLAR-RISTON-MYLAR film. The silicon wafer is rotated against a spring- loaded hot wire filament. The wafer acts as its own template, and the hot wire becomes the stylus. Regardless of where the notch or flat of the wafer is, the hot wire filament will follow the exact contour and burn off the MYLAR-RISTON- MYLAR film to the silicon wafer edge. See Fig. 3. * Trademark of E. I. du Pont de Nemours & Co.

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