Browse Prior Art Database

Programmable Planetary Etching Mechanism

IP.com Disclosure Number: IPCOM000042791D
Original Publication Date: 1984-Jun-01
Included in the Prior Art Database: 2005-Feb-04
Document File: 2 page(s) / 46K

Publishing Venue

IBM

Related People

Knappenberger, JR: AUTHOR [+3]

Abstract

This mechanism controls etch uniformity across large surface areas for two-sided etching of metal substrates. Referring to Fig. 1, the samples to be etched are held in an etch wheel assembly 1, which has individual gear-driven planetary, eccentric mask holders 5 holding sample foil 6. The gear-driven holders are rotated within their pocket position by a central pinion 7 (Fig. 2) of which its hub is held fixed by stationary slotted bracket 8 (Fig. 3) attached to stationary manifold 3. Motion is imparted to the disks 5 by the rotation of wheel 1 driven by driver 9. Spray manifolds 2, 3 are stationary and positioned on the front and back side of etching wheel 1. Rotation of wheel 1 produces a "near" random planetary trace of disks 5 relative to manifolds 2, 3.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 2

Programmable Planetary Etching Mechanism

This mechanism controls etch uniformity across large surface areas for two- sided etching of metal substrates. Referring to Fig. 1, the samples to be etched are held in an etch wheel assembly 1, which has individual gear-driven planetary, eccentric mask holders 5 holding sample foil 6. The gear-driven holders are rotated within their pocket position by a central pinion 7 (Fig. 2) of which its hub is held fixed by stationary slotted bracket 8 (Fig. 3) attached to stationary manifold
3. Motion is imparted to the disks 5 by the rotation of wheel 1 driven by driver 9. Spray manifolds 2, 3 are stationary and positioned on the front and back side of etching wheel 1. Rotation of wheel 1 produces a "near" random planetary trace of disks 5 relative to manifolds 2, 3. Nineteen specially designed "mini" nozzles exhibiting a flat spray pattern are positioned on each radial spoke such that their composite pattern overlap generates a continuous radial "swath" of etchant (304 nozzles/manifold/side). Each nozzle can manually be turned "on" or "off", thus balancing the area etching rate for each side. This programming feature permits "fine tuning" of the etching uniformity over large area formats.

1

Page 2 of 2

2

[This page contains 4 pictures or other non-text objects]