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Ablative Resist for Optical Disk Mastering

IP.com Disclosure Number: IPCOM000042911D
Original Publication Date: 1984-Jun-01
Included in the Prior Art Database: 2005-Feb-04
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Gonnella, NT: AUTHOR [+2]

Abstract

This article describes an ablative resist for optical disk mastering which after addition of a compatible dye allows the use of argon laser light at 4880 A and the reading of the patterns on the resist immediately after writing. The ablative resist is obtained by adding to a classical photoresist polymer a compatible dye (e.g., DISPERSE RED 1*, DISPERSE RED 13*) which absorbs light at a wavelength of 4800 A - 4900 A. Since this resist would absorb the light from the argon laser, a pattern can be written on the master disk by ablating holes in the resist. The pattern can then be read immediately after writing. * Trademark of Aldrich Chemical Company.

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Ablative Resist for Optical Disk Mastering

This article describes an ablative resist for optical disk mastering which after addition of a compatible dye allows the use of argon laser light at 4880 A and the reading of the patterns on the resist immediately after writing. The ablative resist is obtained by adding to a classical photoresist polymer a compatible dye (e.g., DISPERSE RED 1*, DISPERSE RED 13*) which absorbs light at a wavelength of 4800 A - 4900 A. Since this resist would absorb the light from the argon laser, a pattern can be written on the master disk by ablating holes in the resist. The pattern can then be read immediately after writing. * Trademark of Aldrich Chemical Company.

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