Browse Prior Art Database

Front-Side Vacuum Pencil With Point-Contacts

IP.com Disclosure Number: IPCOM000043024D
Original Publication Date: 1984-Jul-01
Included in the Prior Art Database: 2005-Feb-04
Document File: 2 page(s) / 27K

Publishing Venue

IBM

Related People

Cashin, MJ: AUTHOR [+3]

Abstract

A common front-side vacuum pencil for wafer handling, e.g., in CVD (chemical vapor deposition) is a glass tube attached to a vacuum line. The tube usually leaves residue or scratch marks on the wafer. To reduce the residue or scratch marks, the tubing is changed from a full surface contact to a 3-point contact, with the result that contact with the wafer surface leaves little or a negligible amount of residue on the surface. The 3-point contact vacuum pencil can be fabricated by masking the end surface 1 of the glass tubing at three locations 2 (Fig. 1) and contact points 3, etching the tubing in BHf for a few minutes. Only the masked regions will come into contact with the wafer (Fig. 2). This point-contact design can be applied to other types of vacuum pencils including the back-side vacuum pencils.

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Front-Side Vacuum Pencil With Point-Contacts

A common front-side vacuum pencil for wafer handling, e.g., in CVD (chemical vapor deposition) is a glass tube attached to a vacuum line. The tube usually leaves residue or scratch marks on the wafer. To reduce the residue or scratch marks, the tubing is changed from a full surface contact to a 3-point contact, with the result that contact with the wafer surface leaves little or a negligible amount of residue on the surface. The 3-point contact vacuum pencil can be fabricated by masking the end surface 1 of the glass tubing at three locations 2 (Fig. 1) and contact points 3, etching the tubing in BHf for a few minutes. Only the masked regions will come into contact with the wafer (Fig. 2). This point-contact design can be applied to other types of vacuum pencils including the back-side vacuum pencils.

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