Browse Prior Art Database

Emission Spectrum As Process Monitor for Plasma Desmear

IP.com Disclosure Number: IPCOM000043885D
Original Publication Date: 1984-Oct-01
Included in the Prior Art Database: 2005-Feb-05
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Lu, N: AUTHOR [+3]

Abstract

An emission spectrum can be used as a process monitor for plasma desmear and to end the process when most of the smear is gone. The amount of smear varies from batch to batch, and the degree of smear depends on the type of drill bit, turning speed, feed rate and the number of holes drilled. The smear distribution along a hole and the size of the smear vary also. Smear etch rate is approximately ten times faster than epoxy etch rate, and this higher etch rate gives a high emission intensity, as indicated in the use of an emission spectrum. The varying of the intensity of these emission lines in conjunction with the product's temperature makes it possible to find the end point of the plasma desmear, sufficient for the particular product.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Emission Spectrum As Process Monitor for Plasma Desmear

An emission spectrum can be used as a process monitor for plasma desmear and to end the process when most of the smear is gone. The amount of smear varies from batch to batch, and the degree of smear depends on the type of drill bit, turning speed, feed rate and the number of holes drilled. The smear distribution along a hole and the size of the smear vary also. Smear etch rate is approximately ten times faster than epoxy etch rate, and this higher etch rate gives a high emission intensity, as indicated in the use of an emission spectrum. The varying of the intensity of these emission lines in conjunction with the product's temperature makes it possible to find the end point of the plasma desmear, sufficient for the particular product. The degree of smear on the boards under processing can also be found using the emission spectrum.

1