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Microwave Stimulated Ion Source

IP.com Disclosure Number: IPCOM000044034D
Original Publication Date: 1984-Oct-01
Included in the Prior Art Database: 2005-Feb-05
Document File: 2 page(s) / 25K

Publishing Venue

IBM

Related People

Cuomo, JJ: AUTHOR [+4]

Abstract

An ion gun which uses a microwave plasma, as a source of ions, obviates the use of filaments which can burn out rapidly upon exposure in a corrosive environment. This ion source eliminates the need to use electromagnets to produce plasmas and the need for ceramic to metal high vacuum seals. Producing a plasma upstream of the ion gun 11, using microwave stimulation (12) at a range of pressures, allows ions to be extracted (13) from the plasma source. The plasma is fed directly into the ion gun 11 without an intervening ceramic window. Direct pumping on the chamber 14 reduces pressure to a level where substrates can be processed without the use of a magnetic field.

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Microwave Stimulated Ion Source

An ion gun which uses a microwave plasma, as a source of ions, obviates the use of filaments which can burn out rapidly upon exposure in a corrosive environment. This ion source eliminates the need to use electromagnets to produce plasmas and the need for ceramic to metal high vacuum seals. Producing a plasma upstream of the ion gun 11, using microwave stimulation
(12) at a range of pressures, allows ions to be extracted (13) from the plasma source. The plasma is fed directly into the ion gun 11 without an intervening ceramic window. Direct pumping on the chamber 14 reduces pressure to a level where substrates can be processed without the use of a magnetic field.

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