Browse Prior Art Database

High Density Information Storage Substrate

IP.com Disclosure Number: IPCOM000044115D
Original Publication Date: 1984-Nov-01
Included in the Prior Art Database: 2005-Feb-05
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Baxter, DW: AUTHOR [+2]

Abstract

This article describes an optical or magnetic disk substrate with servo information permanently etched into the substrate by means of semiconductor techniques. The substrate consists of a single crystal silicon wafer and a layer of silicon oxide with servo information permanently etched therein to form circular tracks. The process used for making the substrate comprises the following steps. 1. Start with the normal single crystal silicon wafer used in making semiconductors. 2. Apply an oxide film (1500 A thick) by either growing it or sputtering it on the surface. 3. Apply photoresist to the oxide surface. 4. Expose the photoresist with normal UV (ultraviolet) contact printing, electron beam proximity printing or a UV laser, such as an argon laser. 5. Develop the photoresist patterns by normal solvent techniques. 6.

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High Density Information Storage Substrate

This article describes an optical or magnetic disk substrate with servo information permanently etched into the substrate by means of semiconductor techniques. The substrate consists of a single crystal silicon wafer and a layer of silicon oxide with servo information permanently etched therein to form circular tracks. The process used for making the substrate comprises the following steps.
1. Start with the normal single crystal silicon wafer used in making semiconductors. 2. Apply an oxide film (1500 A thick) by either growing it or sputtering it on the surface. 3. Apply photoresist to the oxide surface. 4. Expose the photoresist with normal UV (ultraviolet) contact printing, electron beam proximity printing or a UV laser, such as an argon laser. 5. Develop the photoresist patterns by normal solvent techniques. 6. Etch the pattern in the silicon oxide layer with an aqueous etchant or reactive ion etching (RIE). 7. Strip off the photoresist leaving the track pattern in the silicon oxide layer. 8. For a magnetic disk substrate overcoat this substrate with a magnetic media.

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