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Viscous Etchant Application Apparatus

IP.com Disclosure Number: IPCOM000044273D
Original Publication Date: 1984-Nov-01
Included in the Prior Art Database: 2005-Feb-05
Document File: 2 page(s) / 34K

Publishing Venue

IBM

Related People

Goubau, WM: AUTHOR

Abstract

Chemi-mechanical etching employing the principle of viscous-drag stripping is used in connection with a doctor-bladed roller apparatus for uniform etching. Referring to the drawing, the structure consists of a roller R having a roughened surface or covered with a cloth sock that prevents slipping of the etchant. The roller rotates in a groove at the bottom of a rectangular tank. For counterclockwise rotation, the right side of the tank holds fresh etchant while the left side catches depleted etchant. The groove serves to clean the roller and to isolate the two halves of the tank. As the roller advances, viscous drag draws etchant between the roller and guide bar B. A knife edge K at the top of the guide bar regulates the thickness of etchant on the roller.

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Viscous Etchant Application Apparatus

Chemi-mechanical etching employing the principle of viscous-drag stripping is used in connection with a doctor-bladed roller apparatus for uniform etching. Referring to the drawing, the structure consists of a roller R having a roughened surface or covered with a cloth sock that prevents slipping of the etchant. The roller rotates in a groove at the bottom of a rectangular tank. For counterclockwise rotation, the right side of the tank holds fresh etchant while the left side catches depleted etchant. The groove serves to clean the roller and to isolate the two halves of the tank. As the roller advances, viscous drag draws etchant between the roller and guide bar B. A knife edge K at the top of the guide bar regulates the thickness of etchant on the roller. The sample to be etched advances continuously on guide rails from left to right. The spacing between substrate and roller as well as the rotation speed of roller and linear velocity of the substrate are adjusted such that etching is completed in a single pass.

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