Browse Prior Art Database

Planetary Motion Fixture Plate for Plasma Processing and Thin Film Deposition

IP.com Disclosure Number: IPCOM000044415D
Original Publication Date: 1984-Dec-01
Included in the Prior Art Database: 2005-Feb-05
Document File: 2 page(s) / 95K

Publishing Venue

IBM

Related People

Bright, AA: AUTHOR [+2]

Abstract

A planetary rotation mechanism, a wafer-retaining mechanism using retention rings, and a bearing and dry contact assembly coact to form a high quality planetary cathode for use in RF processing. Implementation of a planetary rotation mechanism provides wafer rotation as well as fixture rotation from a single drive. This mechanism (Fig. 1), consists of an isolated stationary pinwheel assembly 11 against which sprocket gears 12, attached to the wafer holders 13 (Fig. 2), rotate. The pinwheel/sprocket design reduces friction as well as eases mesh-alignment tolerances. The wafer-retention mechanism utilizes retaining rings to provide uniform pressure at all points on the periphery of the wafer.

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Planetary Motion Fixture Plate for Plasma Processing and Thin Film Deposition

A planetary rotation mechanism, a wafer-retaining mechanism using retention rings, and a bearing and dry contact assembly coact to form a high quality planetary cathode for use in RF processing. Implementation of a planetary rotation mechanism provides wafer rotation as well as fixture rotation from a single drive. This mechanism (Fig. 1), consists of an isolated stationary pinwheel assembly 11 against which sprocket gears 12, attached to the wafer holders 13 (Fig. 2), rotate. The pinwheel/sprocket design reduces friction as well as eases mesh-alignment tolerances. The wafer-retention mechanism utilizes retaining rings to provide uniform pressure at all points on the periphery of the wafer. The rings are held in place by spring-loaded retaining clamp fingers 14 which are positioned so as not to rub against surfaces, thereby avoiding particulate contamination. The bearing and dry contact assembly, provided to achieve uniform, reliable RF and thermal contact to the rotating wafer pedestals, with negligible particulate erosion, includes thrust bearings 15 and needle bearings
16. The bearings are of heat- treatable stainless steel to provide low friction rotation of the wafer holder 13 without the use of lubricants.

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