Browse Prior Art Database

Anti-Splatter Septum Ring

IP.com Disclosure Number: IPCOM000044675D
Original Publication Date: 1984-Dec-01
Included in the Prior Art Database: 2005-Feb-06
Document File: 2 page(s) / 60K

Publishing Venue

IBM

Related People

Specht, DJ: AUTHOR

Abstract

An anti-splatter septum ring (ASR) with angled fins in the base plate catches excess spun-off photoresist, reducing resist backside splatter on wafers. The ASR is designed to reduce resist backside splatter on wafers. Sixty septum fins 11 are evenly spaced around the base plate 12 at 6Πintervals. The fins 11 are vertical in position and oriented so that they lay in the plane tangent to the edge of the wafer 13. The fins 11 are extremely thin and have a knife-sharp front edge. Resist is thrown off the wafers and passes the fins 11 almost undisturbed. Once the resist strikes the splash ring 14, it is atomized with the particles traveling in random directions. Most of the particles strike and adhere to the fins 11, thereby reducing the quantity available to reach the wafer.

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Anti-Splatter Septum Ring

An anti-splatter septum ring (ASR) with angled fins in the base plate catches excess spun-off photoresist, reducing resist backside splatter on wafers. The ASR is designed to reduce resist backside splatter on wafers. Sixty septum fins 11 are evenly spaced around the base plate 12 at 6OE intervals. The fins 11 are vertical in position and oriented so that they lay in the plane tangent to the edge of the wafer 13. The fins 11 are extremely thin and have a knife-sharp front edge. Resist is thrown off the wafers and passes the fins 11 almost undisturbed. Once the resist strikes the splash ring 14, it is atomized with the particles traveling in random directions. Most of the particles strike and adhere to the fins 11, thereby reducing the quantity available to reach the wafer.

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