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Browse Prior Art Database

Printing of Photolithography Patterns

IP.com Disclosure Number: IPCOM000044811D
Original Publication Date: 1984-Sep-01
Included in the Prior Art Database: 2005-Feb-06
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Parker, DE: AUTHOR [+2]

Abstract

In normal photolithography processes, an artwork pattern is used to expose photoresist layers which are subsequently developed, baked and used to etch the desired pattern in metal or dielectric layers.

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Printing of Photolithography Patterns

In normal photolithography processes, an artwork pattern is used to expose photoresist layers which are subsequently developed, baked and used to etch the desired pattern in metal or dielectric layers.

In this article, offset printing produces artwork patterns directly on the surface of photoresist coated parts. Inks with optical densities adequate to block the ultra-violet light used to produce patterns in photoresist materials are currently available. After photolithographic processing, the ink pattern is stripped away with the underlying unexposed resist.

Significant advantages of this technique include improvements in artwork life, resolution, and manufacturability. The life of the offset printing plate used to produce artwork patterns far exceeds the useful life of glass or film base artwork typically used in standard photolithography. Offset printing resolution exceeds that required for printed circuit boards and display applications, while resolution characteristics typical of full contact printing are achieved without the wear-and- tear on artwork. In addition, this method offers improved manufacturability, since it is a very high speed, in-line process not limited by exposure time or proximity printing constraints.

Anonymous

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