Browse Prior Art Database

Enhancement of the Single Step Lift-off Process

IP.com Disclosure Number: IPCOM000044825D
Original Publication Date: 1984-Oct-01
Included in the Prior Art Database: 2005-Feb-06
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Feinberg, GM: AUTHOR [+2]

Abstract

This teaches that the addition of a chlorobenzene soluble carboxylic acid such as cinnamic or abietic acids to positive photoresist enhances the solvent soak step in the single step lift-off process, allowing one to be able to shorten this time as desired. The more acid one adds, the shorter the soak time. This soak time creates a developer resistant crust by extracting the added acid, creating the overhang which is neccessary for lift-off structure and can be applied to any compatible solvent-acid combination in which the photoresist polymer and photoactive compound were mutually insoluble.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Enhancement of the Single Step Lift-off Process

This teaches that the addition of a chlorobenzene soluble carboxylic acid such as cinnamic or abietic acids to positive photoresist enhances the solvent soak step in the single step lift-off process, allowing one to be able to shorten this time as desired. The more acid one adds, the shorter the soak time. This soak time creates a developer resistant crust by extracting the added acid, creating the overhang which is neccessary for lift-off structure and can be applied to any compatible solvent-acid combination in which the photoresist polymer and photoactive compound were mutually insoluble.

Disclosed anonymously

1