Browse Prior Art Database

Nondischarge Magnetoplasma Ion Source

IP.com Disclosure Number: IPCOM000044950D
Original Publication Date: 1983-Jan-01
Included in the Prior Art Database: 2005-Feb-06
Document File: 2 page(s) / 29K

Publishing Venue

IBM

Related People

McCorkle, RA: AUTHOR

Abstract

An ion source of high spectral brightness is described which is not limited by space-charge or Boersch effects at the source and which has a low energy of formation.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 57% of the total text.

Page 1 of 2

Nondischarge Magnetoplasma Ion Source

An ion source of high spectral brightness is described which is not limited by space-charge or Boersch effects at the source and which has a low energy of formation.

The brightest sources of ions in existence rely on field ionization from a point (as offered, for example, by Oxford Applied Research-Model 201). However, it has recently been recognized (1) that the Boersch effect, as well as space- charge, has a limiting influence on the spectral brightness of these sources. Furthermore, it is now appreciated that the Boersch effect seriously limits peak current density in field-emitting sources and, in fact, provides a serious barrier to the usefulness of charged particle beams when used for writing patterns of 9.2 Mum or less in size (2).

This article describes means whereby a controllable double-sheath in a dischargeless magnetoplasma (3) may be employed to obtain stable ion beams beyond the limit of field-emitting sources and with a significantly enhanced voltage range and a controllable angular emission.

As demonstrated in (3), utilization of a potential difference between two electrodes in a surface ionization plasma confined radially by a magnetic field strong enough to magnetize the ions allows the establishment of stationary double-sheaths supporting potential drops that can be adjusted to be many times the ionization potential of the gases used. Moreover, adjustment of the location of the double-layer along the axis o...