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Novel Multilayer Photoresist Structure for E-Beam Mask Making

IP.com Disclosure Number: IPCOM000045084D
Original Publication Date: 1983-Jan-01
Included in the Prior Art Database: 2005-Feb-06
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Cook, FD: AUTHOR [+3]

Abstract

A multilayer photoresist structure for E-beam mask making is described. Masks are made by employing a conventional photoresist layer on a typical chrome clad glass plate. The photoresist layer is, in turn, coated with a layer of E-beam sensitive resist.

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Novel Multilayer Photoresist Structure for E-Beam Mask Making

A multilayer photoresist structure for E-beam mask making is described. Masks are made by employing a conventional photoresist layer on a typical chrome clad glass plate. The photoresist layer is, in turn, coated with a layer of E-beam sensitive resist.

One of the difficulties encountered with E-beam exposure systems resides in the backscattering of secondary electrons. The backscattering results in degradation of the image quality by producing ragged edges. The ragged edges become more evident as the photoresist layer becomes thinner, the latter being a requirement for smaller images (1-2 microns). The use of a multilayer resist structure minimizes the effects of backscattering by permitting the use of a very thick underlying resist layer and a very thin upper layer (imaging layer), the latter being employed because of its high resolution capability. However, the multilayer resist schemes reported thus far require complicated processing procedures and/or expensive equipment, e.g., RIB (reactive ion etching) tools, organic glass barriers, silicon nitride barriers, etc. The process proposed here provides a simple procedure which does not require complex or expensive equipment.

The first step in the process involves blanket exposing the entire photoresist layer of a diazo-type coated chrome clad glass plate with light in the wavelength range of 300-500 nm. Diazo plates are standard product which may be purchased from any of a variety of vendors for purposes of optical fabrication of chrome masks. After the plates have been blanket exposed, an E-beam sensitive resist laye...