Browse Prior Art Database

Quartz Ware for Semiconductor Manufacturing Applications

IP.com Disclosure Number: IPCOM000045095D
Original Publication Date: 1983-Jan-01
Included in the Prior Art Database: 2005-Feb-06
Document File: 2 page(s) / 91K

Publishing Venue

IBM

Related People

Deseez, C: AUTHOR [+3]

Abstract

In many steps of standard silicon wafer open-tube processing, such as diffusion (or oxidation), a movable quartz paddle containing a batch of carefully cleaned wafers, to be processed, is pushed into the hot zone of a diffusion tube disposed within the diffusion furnace.

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Quartz Ware for Semiconductor Manufacturing Applications

In many steps of standard silicon wafer open-tube processing, such as diffusion (or oxidation), a movable quartz paddle containing a batch of carefully cleaned wafers, to be processed, is pushed into the hot zone of a diffusion tube disposed within the diffusion furnace.

An improvement to this standard technique consists in the use of an intermediate quartz boat which is adapted to both various diffusion tube sizes and different types of paddles. The photograph shows this boat supporting a specifically designed paddle carrying three wafers. As an additional improvement, the boat features tilted quartz wheels which greatly avoid the well- known problems related to paddle guiding. In addition to its versatility, this quartz ware has demonstrated very good results particularly in the process yields when automatic loading techniques are used.

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