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Casting Solvent for Polyarylsulfone

IP.com Disclosure Number: IPCOM000045199D
Original Publication Date: 1983-Feb-01
Included in the Prior Art Database: 2005-Feb-06
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Migliore, MJ: AUTHOR

Abstract

Gamma Butyrolactone can be used as a casting solvent with diglyme to produce thin (1000 to 5000 Angstrom), uniform, spin-coated films of polyarylsulfone on silicon wafers with nitride, oxide or bare silicon surfaces. The casting solvent serves as a transport medium for the solution polymer and as a release agent during decal removal in an additive lift-off process for semiconductor metallization.

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Casting Solvent for Polyarylsulfone

Gamma Butyrolactone can be used as a casting solvent with diglyme to produce thin (1000 to 5000 Angstrom), uniform, spin-coated films of polyarylsulfone on silicon wafers with nitride, oxide or bare silicon surfaces. The casting solvent serves as a transport medium for the solution polymer and as a release agent during decal removal in an additive lift-off process for semiconductor metallization.

Polyarylsulfone films cast from Gamma butyrolactone and diglyme were chemically stable in solution and during drying. The films were craze and crack free, showed no evidence of outgassing and were free from gel and pinhole defects.

The advantages over the N-methyl-2 pyrrolidone/diglyme casting system are thicker films without cracking or craze and more uniform coatings.

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