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Browse Prior Art Database

Two Piece Diffusion Tube for Semiconductor Manufacturing Applications

IP.com Disclosure Number: IPCOM000045256D
Original Publication Date: 1983-Feb-01
Included in the Prior Art Database: 2005-Feb-06
Document File: 2 page(s) / 104K

Publishing Venue

IBM

Related People

Deseez, C: AUTHOR [+4]

Abstract

This arrangement of quartz parts is for oxidation and diffusion operations in semiconductor manufacturing applications. The backside portion of a diffusion tube 10, such as represented in the above photograph, is inserted into a furnace where either the diffusion or oxidation step or both steps are carried out.

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Two Piece Diffusion Tube for Semiconductor Manufacturing Applications

This arrangement of quartz parts is for oxidation and diffusion operations in semiconductor manufacturing applications. The backside portion of a diffusion tube 10, such as represented in the above photograph, is inserted into a furnace where either the diffusion or oxidation step or both steps are carried out.

The improvement described here simply consists in providing a removable injector 11 to the gas inlet tube 12 In an oxidation step, oxygen and water steam are introduced through injector 11 within the tube where they mix above the wafers (not shown). Nitrogen is injected through an exhaust port (not shown) to assure a protective gas curtain in the front end of the tube. All gasses are evacuated through tube 14. Tube 13 is adapted to receive a thermocouple.

Previously the injector was integral with the tube, so the cleaning of the tube in a vertical, clean bench was difficult and often resulted in breaking the injector, thus leading to the replacement of the whole tube or at least to delicate repairing.

In addition, different models of injectors may be designed to fit into the open end of the tube 12, thus allowing one to use appropriate gas flows for different applications and/or steps.

The present improvement makes it easier to clean the diffusion tube and reduces the likelihood of its breaking.

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