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Film Structure for Vertical Magnetic Recording

IP.com Disclosure Number: IPCOM000045267D
Original Publication Date: 1983-Feb-01
Included in the Prior Art Database: 2005-Feb-06
Document File: 2 page(s) / 55K

Publishing Venue

IBM

Related People

Bayer, T: AUTHOR [+5]

Abstract

A hard magnetic film (e.g., FeCoCr) is structured by plasma treatment in such a manner that magnetic needles are produced perpendicular to its surface. The shape anisotropy of these needles renders them suitable for vertical recording.

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Film Structure for Vertical Magnetic Recording

A hard magnetic film (e.g., FeCoCr) is structured by plasma treatment in such a manner that magnetic needles are produced perpendicular to its surface. The shape anisotropy of these needles renders them suitable for vertical recording.

On a substrate 1 and an undercoat layer 2 (e.g., Cr), a soft magnetic layer 3 (e.g., NiFe) is vapor deposited. Layer 3 serves as an etch stopper for the layer covering it and as a low magnetic resistance, thus forming the keeper layer for the actual storage layer 4. Storage layer 4 of hard magnetic material (e.g., FeCoCr) is applied with a thickness of about 1 Mum across the entire substrate surface. Storage layer 4 is initially exposed to a hydrocarbonaceous plasma (e.g., CHF(3)) for generating a micromask and subsequently C1(2) plasma etched producing the needle structure (Figs. 1 and 2) with needles 5 in the interstices 6. Needles 5 have a length of about 1 Mum, a thickness of about 0.1 Mum and a mutual spacing of about 0.1 to 0.2 Mum. Then, the structured storage layer 4 is protected by filling interstices 6. This is done by spin coating with polyimide followed by plasma etching for adjusting the distance of the needle tips from the surface or by plasma deposition of SiN(x) followed by polishing. To optimize the wear characteristics of the storage layer, an additional thin protective layer of, for example, rhodium, may be applied.

The dot-like micromask, essential for etching, is o...