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Sensitizer for Resists

IP.com Disclosure Number: IPCOM000045458D
Original Publication Date: 1983-Mar-01
Included in the Prior Art Database: 2005-Feb-07
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Sachdev, KG: AUTHOR

Abstract

Novolak-type matrix resins are made sensitive to radiation by incorporating in them a mixture of esters of 1-oxo-2-diazo-naphthoquinone-4-sulfonyl chloride and 1-oxo-2-diazo-naphthoquinone-5-sulfonyl chloride with dihydroxylbenzophenone.

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Sensitizer for Resists

Novolak-type matrix resins are made sensitive to radiation by incorporating in them a mixture of esters of 1-oxo-2-diazo-naphthoquinone-4-sulfonyl chloride and 1-oxo-2-diazo-naphthoquinone-5-sulfonyl chloride with dihydroxylbenzophenone.

The use of mixtures of isomers increases the amount of sensitizer which can be incorporated in the resin. The sensitized mixture is particularly useful as a positive resist for use with electron beams.

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