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Poly(olefin-Sulfones)-Novolacs As Positive/Negative Tone Deep Uv-Photoresists

IP.com Disclosure Number: IPCOM000045895D
Original Publication Date: 1983-May-01
Included in the Prior Art Database: 2005-Feb-07
Document File: 1 page(s) / 9K

Publishing Venue

IBM

Related People

Hiraoka, H: AUTHOR [+2]

Abstract

Photon energies absorbed by novolac resins are efficiently transferred to poly(olefin-sulfones), giving rise to positive or negative tone polymer patterns, depending on processing conditions. Poly(2methyl-- pentene-l-sulfone) was mixed in l6.5% by weight with a novolac resin and dissolved in AZ-thinner. The resist films were spin coated onto silicon wafers, and prebaked in air on a hot plate.

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Poly(olefin-Sulfones)-Novolacs As Positive/Negative Tone Deep Uv- Photoresists

Photon energies absorbed by novolac resins are efficiently transferred to poly(olefin-sulfones), giving rise to positive or negative tone polymer patterns, depending on processing conditions. Poly(2methyl-- pentene-l-sulfone) was mixed in l6.5% by weight with a novolac resin and dissolved in AZ-thinner. The resist films were spin coated onto silicon wafers, and prebaked in air on a hot plate.

UV-light exposures were carried out with a quartz mask under a medium pressure mercury lamp (Hanovia SH-type). The light intensity at 254 nm was 0.8 mJ/cm/2/. The exposure time was 5 minutes, resulting in a 240 mJ/cm/2/ dose for each exposure.

Positive-tone Deep UV-Photoresist Patterns: For positive tone patterns, the resist films were developed in aqueous alkali developer after UV-exposure.

Negative-tone Deep UV-Photoresist Patterns: For negative tone images poly(2-methyl-pentene-l-sulfone)/novolac matrix resist is particularly suited. For negative tone patterns the resist films were post-baked at l10OEC for l5 minutes in air; then images were developed in aqueous alkali-based developer.

poly(2-methyl-pentene-l sulfone) acted as a sensitezer for cross-- linking of the resin after UV-light exposure. There is no significant film thickness loss for negative tone patterns after development; in fact, no film thickness loss was observed in this case.

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