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Water Developable Photo/Electron Resist

IP.com Disclosure Number: IPCOM000046036D
Original Publication Date: 1983-May-01
Included in the Prior Art Database: 2005-Feb-07
Document File: 3 page(s) / 29K

Publishing Venue

IBM

Related People

LaBar, RA: AUTHOR

Abstract

Positive resists used in the lithographic processes in the manufacturing of microcircuits are developed by the use of organic solvents or alkaline solutions. The choice of developer depends on the chemical change which occurs upon exposure of the resist. Shipley's AZ-l350 is typical of a photoresist which is alkali developable. With appropriate solvents, the exposed portion of the resist is rendered alkaline soluble by conversion of the inhibitor (photoactive compound) to an alkaline soluble moiety. The chemistry and mechanism of systems of this type are well known to those skilled in the art.

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Water Developable Photo/Electron Resist

Positive resists used in the lithographic processes in the manufacturing of microcircuits are developed by the use of organic solvents or alkaline solutions. The choice of developer depends on the chemical change which occurs upon exposure of the resist. Shipley's AZ-l350 is typical of a photoresist which is alkali developable. With appropriate solvents, the exposed portion of the resist is rendered alkaline soluble by conversion of the inhibitor (photoactive compound) to an alkaline soluble moiety. The chemistry and mechanism of systems of this type are well known to those skilled in the art.

Photo/electron resists are also developable in organic solvents.Resists which are organic developable generally fall into the class of degrading polymers, and they depend on a reduction of molecular weight to effect the developer solubility. Methyl methacrylate and polybutene sulfone are two well-known examples of electron resists which are organic solvent developable. Polymethylisopropenyl ketone is an example of a photoresist which is organic solvent developable.

There has recently been developed an electron resist in which the dissolution inhibitor, of the resin/inhibitor system, decomposes via polymer degradation and the change results in an alkaline soluble exposed area. This system, in effect, is a combination of the two basic systems described above.

The process described here is a unique system which mechanistically is a single component resist which decomposes upon irradiation by polymer degradation to yield aqueous soluble product(s). The system is unique in that it does not require organic solvent or alkaline developer.

The fundamental polymeric resist system has the structure:

(Image Omitted)

Polyacetals (the polymer of structure (a) in this class) have been shown to degrad...