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Lithographic Applications of Composite Resists of Poly(olefin Sulfones) and Poly(hydroxy Styrenes)

IP.com Disclosure Number: IPCOM000046283D
Original Publication Date: 1983-Jun-01
Included in the Prior Art Database: 2005-Feb-07
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Hiraoka, H: AUTHOR [+2]

Abstract

A composite resist of poly(olefin sulfones), specifically poly(2-methyl-l-pentene sulfone), and poly(hydroxy styrenes), specifically brominat- ed poly(hydroxy styrene), is a highly sensitive and high resolution deep UV-photoresist, active below 300 nm wavelength, in negative tone, although partially developed positive tone patterns can be obtained by skipping a post-baking process.

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Lithographic Applications of Composite Resists of Poly(olefin Sulfones) and Poly(hydroxy Styrenes)

A composite resist of poly(olefin sulfones), specifically poly(2-methyl-l- pentene sulfone), and poly(hydroxy styrenes), specifically brominat- ed poly(hydroxy styrene), is a highly sensitive and high resolution deep UV- photoresist, active below 300 nm wavelength, in negative tone, although partially developed positive tone patterns can be obtained by skipping a post-baking process.

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