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Electrostatic Cleaning and Polishing of Substrates

IP.com Disclosure Number: IPCOM000046287D
Original Publication Date: 1983-Jun-01
Included in the Prior Art Database: 2005-Feb-07
Document File: 2 page(s) / 34K

Publishing Venue

IBM

Related People

Larson, WB: AUTHOR [+2]

Abstract

The present methods for magnetic recording disk substrate cleaning are mechanical wiping, air (vacuum and/or pressure), and a wet process using chemicals. Mechanical wiping will remove only loose particles unless high pressure is applied and most particles are only dislodged or displaced, and removal is dependent on the particles clinging to the wiping material. Particles lodged in the wiper material and/or the high pressure exerted may cause physical damage to the surface. Air pressure and vacuum are very ineffective and inefficient. Wet processing utilizes chemicals in cases having the exposure of etching the surface, and is costly, requires a rinsing-drying process, and causes environmental problems of chemical control, exhaust of gases, and disposal of the used solutions.

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Electrostatic Cleaning and Polishing of Substrates

The present methods for magnetic recording disk substrate cleaning are mechanical wiping, air (vacuum and/or pressure), and a wet process using chemicals. Mechanical wiping will remove only loose particles unless high pressure is applied and most particles are only dislodged or displaced, and removal is dependent on the particles clinging to the wiping material. Particles lodged in the wiper material and/or the high pressure exerted may cause physical damage to the surface. Air pressure and vacuum are very ineffective and inefficient. Wet processing utilizes chemicals in cases having the exposure of etching the surface, and is costly, requires a rinsing-drying process, and causes environmental problems of chemical control, exhaust of gases, and disposal of the used solutions.

A solution to the problem is to use electrostatic technology for a dry cleaning process. The system has two major components: (l) a consumable wiper material, and (2) a device to charge the wiper material such as corona.

The theory to explain the system is that the wiper material is charged by the corona due to ionization, and the wiper material is then attracted to the substrate. The wiper material is moved in the opposite direction of the substrate, causing a shearing action, as shown in the figure.

The cleaning or particle transfer action is done by mechanical means of wiping, due to the intimate contact of the wiper material to the subst...