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Etching Borosilicate Glass With Ammonium Hydroxide

IP.com Disclosure Number: IPCOM000046429D
Original Publication Date: 1983-Jul-01
Included in the Prior Art Database: 2005-Feb-07
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Michaud, RA: AUTHOR [+2]

Abstract

Borosilicate glass, formed on silicon wafers in diffusion processes, is removed by an aqueous solution of ammonium hydroxide or ammonium hydroxide and hydrogen peroxide. With the conditions properly adjusted, the borosilicate is etched at a high rate, while the silicon dioxide is only negligibly attacked.

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Etching Borosilicate Glass With Ammonium Hydroxide

Borosilicate glass, formed on silicon wafers in diffusion processes, is removed by an aqueous solution of ammonium hydroxide or ammonium hydroxide and hydrogen peroxide. With the conditions properly adjusted, the borosilicate is etched at a high rate, while the silicon dioxide is only negligibly attacked.

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