Browse Prior Art Database

Five-Degrees-Of-Freedom Stage for a Scanning Electron-Beam Microscope

IP.com Disclosure Number: IPCOM000046670D
Original Publication Date: 1983-Aug-01
Included in the Prior Art Database: 2005-Feb-07
Document File: 3 page(s) / 42K

Publishing Venue

IBM

Related People

Via, G: AUTHOR

Abstract

A five-degrees-of-freedom stage mechanism is shown in the above diagram. The objective of the stage is to enable the placement of a semiconductor wafer into a variety of orientations beneath the point of incidence of a scanning electron beam within a scanning electron-beam microscope chamber. The base 2 can be part of the wall of the electron-beam chamber and may in particular be a part of the access door into the chamber. Mounted on the inner surface of the base 2 is the X rotating table 4 which enables the first degree of motion, which is rotary motion, about the X-axis 5 which is stationary with respect to the base 2. Mounted onto the rotary table 4 is the Z-axis linear slide 6 which enables linear motion in the Z axis which is orthogonal to the X-axis.

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Five-Degrees-Of-Freedom Stage for a Scanning Electron-Beam Microscope

A five-degrees-of-freedom stage mechanism is shown in the above diagram. The objective of the stage is to enable the placement of a semiconductor wafer into a variety of orientations beneath the point of incidence of a scanning electron beam within a scanning electron-beam microscope chamber. The base 2 can be part of the wall of the electron-beam chamber and may in particular be a part of the access door into the chamber. Mounted on the inner surface of the base 2 is the X rotating table 4 which enables the first degree of motion, which is rotary motion, about the X-axis 5 which is stationary with respect to the base 2. Mounted onto the rotary table 4 is the Z-axis linear slide 6 which enables linear motion in the Z axis which is orthogonal to the X-axis. The Z-axis rotates with respect to the base 2, but remains fixed with respect to the rotating table 4. Mounted to the Z-axis linear slide 6 is the yoke 8 whose remote end, with respect to the base 2, supports the Z-pivot which is coincident with the Z-axis 10. The Z- axis 10 is orthogonal to the X-axis 5, and their intersection is coincident with the focal point of the electron beam 12. The electron beam 12 is focussed with the depth of field of approximately one millimeter, thereby enabling the formation of images of the undulating surface of the wafer within excursions of one millimeter. The pivoting bracket 20 is pivotally mounted to the yoke 8 at the Z-axis 10. A wafer surface displacement slide 14 is slidably mounted at the lower portion of the pivoting bracket 12. The pivoting bracket 12 confers the third degree of freedom of motion which is about the Z-axis 10, and the wafer surface displacement slide 14 confers the fourth degree of motion which is linear motion always orthogonal to the Z-axis. Mounted on the wafer surface displacement slide 14 is a quadrant indexing table 16 which rotates the wafer 18, mounted thereon, about an axis coincident with the center of the wafer to thereby enable the examination of selected quadrants of the wafer by the positioning thereof underneath the electron beam 12...