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High Conductance Particle Collector

IP.com Disclosure Number: IPCOM000047039D
Original Publication Date: 1983-Sep-01
Included in the Prior Art Database: 2005-Feb-07
Document File: 2 page(s) / 55K

Publishing Venue

IBM

Related People

Carbone, QJ: AUTHOR [+3]

Abstract

This article concerns a high conductance particle-collecting trap for protecting the pump in a vacuum system from contaminants arising in the system process chamber. The trap is defined by a housing which may be mounted in the vacuum line between the process chamber and pump of a vacuum system. The housing includes three stages of filtering: a two-element filter for removing particulate matter from the evacuant pulled through the trap by the vacuum system pump, an inlet port filter for receiving the evacuant from the process chamber, grossly filtering it and directing it to the two-element filter, and an output filter for finally filtering the evacuant as it exits the trap on its way to the system vacuum pump.

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High Conductance Particle Collector

This article concerns a high conductance particle-collecting trap for protecting the pump in a vacuum system from contaminants arising in the system process chamber. The trap is defined by a housing which may be mounted in the vacuum line between the process chamber and pump of a vacuum system. The housing includes three stages of filtering: a two-element filter for removing particulate matter from the evacuant pulled through the trap by the vacuum system pump, an inlet port filter for receiving the evacuant from the process chamber, grossly filtering it and directing it to the two-element filter, and an output filter for finally filtering the evacuant as it exits the trap on its way to the system vacuum pump. In the course of carrying out certain integrated circuit vacuum manufacturing processes, large amounts of particulate matter may be generated which, if left unchecked, would adversely affect the process equipment. For example, low pressure chemical vapor deposition and plasma chemical vapor deposition give rise to large amounts of deposition "dust" which arise in the process chamber in the course of the deposition. If left unchecked, the evacuated dust would be collected by the system vacuum pump and adversely affect its operation. A high conductance particle-collecting trap for removing such dust is the subject of this article and is shown in the figure. The trap features long-term operation with minimal impedance to gas drawn into the trap by the system vacuum pump. The trap includes quick-release assemblies for permitting convenient removal of the trap from the vacuum system so as to enhance maintainability. As shown in the figure, the trap 10 is defined by a housing 12 having an inlet 14 for receiving evacuant from the system process chamber (not shown) drawn into the trap by the system vacuum pump (also, not shown) and an exhaust port 16 for exiting...