Browse Prior Art Database

Multiple Side Vacuum Coating Apparatus

IP.com Disclosure Number: IPCOM000047233D
Original Publication Date: 1983-Oct-01
Included in the Prior Art Database: 2005-Feb-07
Document File: 2 page(s) / 32K

Publishing Venue

IBM

Related People

Dockendorf, LD: AUTHOR [+3]

Abstract

In order to provide three-dimensional coating in a vacuum deposition chamber, apparatus is provided to impart random flying motions to the objects to be coated. Thin film deposition is usually limited to one side of the object to be coated. It is desirable to have the ability to deposit films uniformly along the entire surface area of an object without multiple processing steps. In the past, special object holders have been used, but they require multiple processing steps. A cone-shaped stainless steel screen 15 is suitably suspended to cover the cross section of chamber 10. The objects 20 to be coated are supported by screen 15. An impacter 35 is fixed to one end of rotary shaft 30 which is driven by motor 25 positioned externally of chamber 10. A hermetic seal 26 maintains the integrity of the vacuum in chamber 10.

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Multiple Side Vacuum Coating Apparatus

In order to provide three-dimensional coating in a vacuum deposition chamber, apparatus is provided to impart random flying motions to the objects to be coated. Thin film deposition is usually limited to one side of the object to be coated. It is desirable to have the ability to deposit films uniformly along the entire surface area of an object without multiple processing steps. In the past, special object holders have been used, but they require multiple processing steps. A cone-shaped stainless steel screen 15 is suitably suspended to cover the cross section of chamber 10. The objects 20 to be coated are supported by screen 15. An impacter 35 is fixed to one end of rotary shaft 30 which is driven by motor 25 positioned externally of chamber 10. A hermetic seal 26 maintains the integrity of the vacuum in chamber 10. Impacter 35 impacts the bottom of screen 15 to impart sufficient energy to objects 20 to cause them to fly with random motions. Evaporation source or sputtering target 50 is located at the bottom of chamber 10, and every surface of the randomly flying objects 20 has a statistically equal opportunity to face downward or toward the evaporation source, whereby the objects become uniformly coated with a thin film.

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