Browse Prior Art Database

Grounding Shield for Electron Beam Gun

IP.com Disclosure Number: IPCOM000047953D
Original Publication Date: 1983-Dec-01
Included in the Prior Art Database: 2005-Feb-08
Document File: 2 page(s) / 22K

Publishing Venue

IBM

Related People

Hoh, PD: AUTHOR

Abstract

Placing a grounded shield on the top of an electron gun eliminates the problem of uncontrolled electron beam scattering of insulating material, which would otherwise lead to poor control of evaporation parameters. Electron beam guns are now widely used for high vacuum evaporation systems in semiconductor and thin film technologies. Electron beam deposition has greater control over evaporation parameters then conventional deposition processes. Utilizing electron beam guns for thin film depositions, better control is obtained of evaporation rate, melt conditions and melt conformations. Problems arise when an insulating material is being evaporated. For example, when silicon monoxide is sublimed by electron beam, SiO is deposited on all surrounding surfaces due to scattering.

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Grounding Shield for Electron Beam Gun

Placing a grounded shield on the top of an electron gun eliminates the problem of uncontrolled electron beam scattering of insulating material, which would otherwise lead to poor control of evaporation parameters. Electron beam guns are now widely used for high vacuum evaporation systems in semiconductor and thin film technologies. Electron beam deposition has greater control over evaporation parameters then conventional deposition processes. Utilizing electron beam guns for thin film depositions, better control is obtained of evaporation rate, melt conditions and melt conformations. Problems arise when an insulating material is being evaporated. For example, when silicon monoxide is sublimed by electron beam, SiO is deposited on all surrounding surfaces due to scattering. This scattered insulator forms an insulating layer which shields the electron beam from ground. Control over E-beam position and shape is lost. This creates an uncontrolled evaporation. Uncontrolled evaporation parameters lead to poor process control which can influence physical properties of thin films. The figure shows a grounding shield 1 on the top of an electron gun 2 (shown in cross-section) to eliminate the uncontrolled electron beam problem. Grounding shield 1 has a gap to provide access to crucible 3. When grounding shield 1 becomes coated, it can easily be removed for cleaning.

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