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Cleaning of Metal Surfaces by Ion Etching

IP.com Disclosure Number: IPCOM000048074D
Original Publication Date: 1981-Dec-01
Included in the Prior Art Database: 2005-Feb-08
Document File: 2 page(s) / 35K

Publishing Venue

IBM

Related People

Wood, JC: AUTHOR

Abstract

Cleaning of a metal surface without damage to the surface topography is effected by ion bombardment in vacuo. The ion beam is caused to impact the target area, which is exposed through a mask, and the current to the target is monitored by means of a conductive shim surrounding the target.

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Cleaning of Metal Surfaces by Ion Etching

Cleaning of a metal surface without damage to the surface topography is effected by ion bombardment in vacuo. The ion beam is caused to impact the target area, which is exposed through a mask, and the current to the target is monitored by means of a conductive shim surrounding the target.

The arrangement in a jig of a substrate to be cleaned is shown in the drawings. The exploded view (Fig.1) shows a substrate 1 on which is formed an array 2 of plated silver electrodes. The substrate is intended for use in an electrochromic display, and the electrodes are deliberately formed with a surface of controlled roughness. It is important that the electrode surfaces should be free of contamination before being immersed in a highly reactive electrochromic solution, but any cleaning process must not significantly alter the surface topography.

The substrate 1 is supported on a base plate 3 and is covered by a copper shim 4. The shim 4 has an aperture 5 larger than array
2. It connects to contacts from each electrode around the periphery of substrate 1 and is provided with a current monitoring lead 6. Above the shim is an insulation layer 7 of neoprene and a top late 8.

These are both provided with aligned apertures equal to the area of the array 2 through which only the electrode array may be exposed to an ion beam. The top plate connects to ground.

The assembly 10 (Fig. 2) of top and bottom plates, insulation layer, shim and substra...