Browse Prior Art Database

Novolac Resins For Lithography

IP.com Disclosure Number: IPCOM000048662D
Original Publication Date: 1982-Mar-01
Included in the Prior Art Database: 2005-Feb-09
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Harada, A: AUTHOR [+3]

Abstract

We have prepared novolac resins for use in lithography from various phenols and various aldehydes. In place of the usual phenol itself, we have used cresols, naphthol and substituents thereof. In place of the usual formaldehyde, we have used benzaldehyde and naphthaldehyde, and substituents thereof.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Novolac Resins For Lithography

We have prepared novolac resins for use in lithography from various phenols and various aldehydes. In place of the usual phenol itself, we have used cresols, naphthol and substituents thereof. In place of the usual formaldehyde, we have used benzaldehyde and naphthaldehyde, and substituents thereof.

By changing the functional group attached to the benzene ring connected to the methylene group of the polymer, a wide range of solubility in developer can be obtained, as well as improved adhesion, high resolution and improved photo and electron beam sensitivities.

Particularly good results were obtained with m-cresol-benzaldehyde novolac resin and with 1-naphthol-4 hydroxy benzaldehyde novolac resin.

1