Dismiss
InnovationQ will be updated on Sunday, Oct. 22, from 10am ET - noon. You may experience brief service interruptions during that time.
Browse Prior Art Database

Water Vapor Generating System For The Thermal Oxidation Of Semiconductors

IP.com Disclosure Number: IPCOM000048807D
Original Publication Date: 1982-Mar-01
Included in the Prior Art Database: 2005-Feb-09
Document File: 2 page(s) / 45K

Publishing Venue

IBM

Related People

Krogmann, G: AUTHOR [+3]

Abstract

This system permits the generation of ultrapure waters vapor in reproducible quantities and the adjustment of water vapor/gas mixtures of arbitrary composition. The quantity of water vapor is automatically adjusted by continuously dosing a small ultrapure water flow, completely evaporating it in a connected quartz evaporator.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 81% of the total text.

Page 1 of 2

Water Vapor Generating System For The Thermal Oxidation Of Semiconductors

This system permits the generation of ultrapure waters vapor in reproducible quantities and the adjustment of water vapor/gas mixtures of arbitrary composition. The quantity of water vapor is automatically adjusted by continuously dosing a small ultrapure water flow, completely evaporating it in a connected quartz evaporator.

The water vapor generating system is shown in the figure. It consists of a dosing vessel 3 of quartz with a flow-limiting capillary 5 and a level control 4. Dosing vessel 3 receives ultrapure water through a dosing valve 1 and a flow rate measuring device 2. The level of the ultrapure water is determined by level control capillary 4. As long as electric valve 6, acting as a 3-way valve, is in its rest state, the ultrapure water is discharged through capillary 5 and discharge tube 7. As parts 1 to 6 are continuously flushed with ultrapure water water in their rest state, contamination of the systen and water volume is prevented. When the electric valve 6 is excited, a particular quantity of ultrapure water, which is determined by the flow resistance of capillary 5 and level h of level control 4 in dosing vessel 3, flows into evaporator 8. The ultrapure water is sucked up by quartz fabric 10 and evaporated by preheated heating coil 9. If desired, oxygen is applied through supply line 11. The water vapor/oxygen mixture is fed from evaporator 8, by line 12, to an oxidation...