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Browse Prior Art Database

Amine N-Oxides as Sensitizers for Resists

IP.com Disclosure Number: IPCOM000049042D
Original Publication Date: 1982-Apr-01
Included in the Prior Art Database: 2005-Feb-09
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Hiraoka, H: AUTHOR

Abstract

High sensitivity and high resolution photo(deep, mid-, and near ultra-violet)- and electron-beam resists in negative working modes are obtained with phenolic novolaks when they are used with amine N-oxides, particularly pyridine N-oxide derivatives, which also can be used as curing and cross-linking agents.

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Amine N-Oxides as Sensitizers for Resists

High sensitivity and high resolution photo(deep, mid-, and near ultra-violet)- and electron-beam resists in negative working modes are obtained with phenolic novolaks when they are used with amine N-oxides, particularly pyridine N-oxide derivatives, which also can be used as curing and cross-linking agents.

For example, pyridine N-oxide was admixed with cresole-formaldehyde resin up to 20 wtpercent and the mixture was dissolved in diglyme (30 wt percent solid part). The resist films were spin-coated onto silicon wafers at 2000 rpm to yield a 1 um film thickness. The resist films were then prebaked at 85-90 degrees C for 15 minutes.

Ultraviolet (UV)-exposure was carried out with a quartz mask in a contact mode with a medium pressure mercury lamp; a 30-second exposure period was provided the resist patterns after development without any significant loss of remaining film thickness. Development for 1 minute in (1:5)AZ2401 (Shipley Company) developer yielded high resolution resist patterns with near vertical wall profile.

The medium pressure mercury lamp has 254 nm light intensity 0.5 mW/cm2, as measured with Optical Associate UV-power meter; the result indicates quite high sensitivity as deep UV-photoresist with pyridine N-oxide sensitizer.

The exposure was carried out with a Vector scan electron-beam exposure system as well as with an ISI scanning electron microscope with the help of a micro-microammeter and a lab timer. Wi...