Browse Prior Art Database

Process for Micro Mechanical Device on Silicon Substrate Using Selectively Removable Polysulfone

IP.com Disclosure Number: IPCOM000049205D
Original Publication Date: 1982-May-01
Included in the Prior Art Database: 2005-Feb-09
Document File: 2 page(s) / 38K

Publishing Venue

IBM

Related People

Schopen, TJ: AUTHOR

Abstract

A metal micro membrane is formed on a silicon substrate over a layer of polysulfone. The process step that forms the membrane also forms a frame around the membrane. In a step in which the membrane is formed into a movable armature, the underlying polysulfone is removed within the frame area.

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Process for Micro Mechanical Device on Silicon Substrate Using Selectively Removable Polysulfone

A metal micro membrane is formed on a silicon substrate over a layer of polysulfone. The process step that forms the membrane also forms a frame around the membrane. In a step in which the membrane is formed into a movable armature, the underlying polysulfone is removed within the frame area.

Metal micromembranes can be used as electrostatically movable armatures for switches. See U.S. Patent 4,229,732 and IBM J. Res. Develop. 23, 376-384 (July 1979).

In the process for the structure of Fig. 1, a layer of polysulfone 2 is formed over the cleaned surface of a P-type silicon substrate 3. In an intermediate step of the process the polysulfone supports layers of glass 4 and metal 5 in the area of the membrane and in other areas 4', 5', and in a later step the polysulfone is removed in an area 2' of the membrane. After the polysulfone layer is formed, it is exposed and removed selectively and the metal glass areas 4" and 5" are formed where the polysulfone is removed and the areas 4, 5, and 4', 5' are formed on the remaining polysulfone. The metal and glass areas 4", 5" form a frame around the area of the membrane. Next a photoresist 6 is formed over the frame. A third photoresist layer (not shown) is formed, exposed and removed over the area 7 where the glass and metal layers 4, 5 are removed to define the flexible membrane. An etch then removes the polysulfone in area 2'...