Browse Prior Art Database

Ultra-Soft X-Ray Lithography

IP.com Disclosure Number: IPCOM000049241D
Original Publication Date: 1982-Apr-01
Included in the Prior Art Database: 2005-Feb-09
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Coleman, G: AUTHOR [+2]

Abstract

We propose to use a membrane fabricated from a material which has a passband in the range of about 100 Angstroms to 400 Angstroms, such as silicon, aluminum or magnesium, as a supporting substrate for an X-ray mask. There are very attractive X-ray sources and existing resists sensitive in the 100 Angstroms to 400 Angstroms range, so that 0.1 Mum scale lithography could be advantageously implemented with such a mask.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 71% of the total text.

Page 1 of 1

Ultra-Soft X-Ray Lithography

We propose to use a membrane fabricated from a material which has a passband in the range of about 100 Angstroms to 400 Angstroms, such as silicon, aluminum or magnesium, as a supporting substrate for an X-ray mask. There are very attractive X-ray sources and existing resists sensitive in the 100 Angstroms to 400 Angstroms range, so that 0.1 Mum scale lithography could be advantageously implemented with such a mask.

It is generally thought that about 10 Angstroms radiation is needed for X-ray lithogrephy due to pass band limitations imposed by an X-ray mask substrate. However, in the relatively obscure spectral region of about 100 Angstroms to 400 Angstroms there exist several useful materials (at least) with significant pass bands (i.e., transmission bands). For example, silicon has an attractive window from 126 Angstroms to about 600 Angstroms such that for self supporting thin crystals of 0.2 Mum thickness fabricated by etching to a boron doped film (see Cheung, Rev. Sci. Instrum. 51 , 1212-1216 (1980)), greater than 50% transmission of incident flux occurs. A parylene overcoat would increase durability. Less attractive in some regards (although with more attractive transmission values) are thin self-supporting or mesh-supported films of aluminum or magnesium with small percentage (approximately 1%) doping with silicon and/or with titanium overcoating. A plasma deposited thin diamond-like carbon film could also be used either alone...