Browse Prior Art Database

Multiple Reticles on a Common Plate

IP.com Disclosure Number: IPCOM000049562D
Original Publication Date: 1982-Jun-01
Included in the Prior Art Database: 2005-Feb-09
Document File: 2 page(s) / 26K

Publishing Venue

IBM

Related People

Kraycir, JR: AUTHOR [+2]

Abstract

In wafer exposure systems employing lower magnifications it is advantageous to employ a plate with a plurality of reticles (masks) to improve the resolution and accuracy of overlay.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 2

Multiple Reticles on a Common Plate

In wafer exposure systems employing lower magnifications it is advantageous to employ a plate with a plurality of reticles (masks) to improve the resolution and accuracy of overlay.

In the drawing, the plate 10 is shown as having four reticles 11A through 11D, although it is not necessarily so limited. These represent the successive exposure patterns necessary for complete fabrication of a semiconductor.

The advantages arising from the multiple reticles on a single plate are: 1. Uniform image size for a reticle set because of common resist/ chrome processing. 2. Reduction in chip to chip position errors due to temperature variations during reticle preparation. 3. Tool variations (reticle producing system) from layer to layer are minimized when stepped on one plate. 4. Cost improvement. 5. Less storage and handling required for a single reticle rather than multiple reticles.

1

Page 2 of 2

2

[This page contains 1 picture or other non-text object]