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Browse Prior Art Database

Process for Treatment of a Molybdenum Surface to Resume Photoresist

IP.com Disclosure Number: IPCOM000049754D
Original Publication Date: 1982-Jul-01
Included in the Prior Art Database: 2005-Feb-09
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Wirtz, LH: AUTHOR

Abstract

This article describes a chemical formulation that, in a single step, will prepare an oxide-free molybdenum surface that is highly receptive to organic polymers such as photoresist.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

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Process for Treatment of a Molybdenum Surface to Resume Photoresist

This article describes a chemical formulation that, in a single step, will prepare an oxide-free molybdenum surface that is highly receptive to organic polymers such as photoresist.

Varying mixtures of sodium hydroxide and sodium persulfate are dissolved in deionized water. For example, 20-40 grams of sodium hydroxide and 50-150 grams of sodium persulfate are dissolved in water to make a solution with a total volume of one liter. Typical processing is as follows:

1. Immerse parts in the solution at room

temperature for 5 minutes.

2. Rinse in deionized water (5-minute minimum).

3. Oven dry to remove water.

4. Coat photoresist.

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