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Crystalline Polymers for Photochemical Hole Burning Applications

IP.com Disclosure Number: IPCOM000049792D
Original Publication Date: 1982-Jul-01
Included in the Prior Art Database: 2005-Feb-09
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Gutierrez, A: AUTHOR

Abstract

Crystalline and polycrystalline polymers serve as hosts for photochemical hole buring chromophors. An example of such a system includes the chronophor phthalocyanine (H(2)PC) in the host high density polyethylene. Holes obtained with H(2)PC in this crystalline polymer have a full width at half maximum of the order of less than 0.1cm/-1/, whereas holes obtained with H(2)PC in the amorphous most polymethyl methacrylate have a width of the order of greater than 0.1cm/-1/.

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Crystalline Polymers for Photochemical Hole Burning Applications

Crystalline and polycrystalline polymers serve as hosts for photochemical hole buring chromophors. An example of such a system includes the chronophor phthalocyanine (H(2)PC) in the host high density polyethylene. Holes obtained with H(2)PC in this crystalline polymer have a full width at half maximum of the order of less than 0.1cm/-1/, whereas holes obtained with H(2)PC in the amorphous most polymethyl methacrylate have a width of the order of greater than 0.1cm/-1/.

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