Browse Prior Art Database

Proximity Correction in E-Beam Systems

IP.com Disclosure Number: IPCOM000049897D
Original Publication Date: 1982-Aug-01
Included in the Prior Art Database: 2005-Feb-09
Document File: 2 page(s) / 32K

Publishing Venue

IBM

Related People

Anantha, NG: AUTHOR [+3]

Abstract

The area between unequal-sized E-beam resist images, in close proximity to each other, is properly resolved by the use of an additional inverse pattern E-beam exposure restricted to the area cited.

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Proximity Correction in E-Beam Systems

The area between unequal-sized E-beam resist images, in close proximity to each other, is properly resolved by the use of an additional inverse pattern E- beam exposure restricted to the area cited.

Two negative geometry areas 1 and 2 are shown in the figure, area 1 being much larger than area 2 and in close proximity to it. Proximity effects prevent proper E-beam exposure of the area A between areas 1 and 2 with the result that edges 3 and 4 are not resolved satisfactorily when the exposed resist is developed.

By generating a positive data set corresponding to area A, area A is exposed again with an E-beam dose. Upon development, edges 3 and 4 are sharply defined.

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