Browse Prior Art Database

Semiconductor Wafer Wet Processing Rotating Apparatus

IP.com Disclosure Number: IPCOM000050317D
Original Publication Date: 1982-Oct-01
Included in the Prior Art Database: 2005-Feb-10
Document File: 2 page(s) / 30K

Publishing Venue

IBM

Related People

Rieckhoff, M: AUTHOR [+2]

Abstract

This apparatus uniformly processes light workpieces, such as semiconductor wafers, especially during liquid treatment operations, by continuously rotating the wafers within its carrier.

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Semiconductor Wafer Wet Processing Rotating Apparatus

This apparatus uniformly processes light workpieces, such as semiconductor wafers, especially during liquid treatment operations, by continuously rotating the wafers within its carrier.

Generally, wafers 1 are vertically positioned in grooves of a carrier 2. At the bottom of carrier 2, shaft 3 is rotatably mounted in bearings 4 in a tank 5, filled with an etchant or another solution, and is driven by motor 6 through belt 7.

When carrier 2 is placed in tank 5, wafers 1 are lifted by a small distance A from their original position (dotted lines at the bottom) by shaft 3, so that shaft 3 and wafers 1 are frictionally connected and the wafers are rotatably driven. Steady wafer rotation is ensured by helical grooves 8 on shaft 3, particularly if orientation notches are provided on the outer edge of wafers 1.

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