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Aqueous Resist Stripper

IP.com Disclosure Number: IPCOM000050466D
Original Publication Date: 1982-Nov-01
Included in the Prior Art Database: 2005-Feb-10
Document File: 2 page(s) / 159K

Publishing Venue

IBM

Related People

Lang, RN: AUTHOR [+2]

Abstract

Current resist, such as novolak/o-quinonediazide resist (Shipley's AZ-2400), is normally stripped with toxic, hazardous or flammable chemicals, such as Caro s acid, acetone, organic solvents and oxygen plasms.

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Aqueous Resist Stripper

Current resist, such as novolak/o-quinonediazide resist (Shipley's AZ-2400), is normally stripped with toxic, hazardous or flammable chemicals, such as Caro s acid, acetone, organic solvents and oxygen plasms.

Described here is a relatively safe non-toxic process for stripping even highly (250 degrees C) baked positive novolak resists. The process consists of utilizing pressurized steam generated in a pressure pot. The steam penetrates the film and produces massive cracking, and eventually delamination occurs. The process was performed in a pressure cooker at 15 psi. and 100-150 degrees C. Breakdown of the film occurs in the time frame of 2-30 minutes.

The process was successful on o-quinonediazide and polyolefin sulfone novolak resists. All films were previously plasma hardened and baked at 250 degrees C for 30 minutes.

The process is very simple and involves non-toxic, inexpensive chemicals. The steam delamination process can also find application in the lift-off process on structures described in U.S. Patents 4,004,044 and 4,090,006.

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