Browse Prior Art Database

Apparatus for Cleaning and Drying Wafers

IP.com Disclosure Number: IPCOM000050473D
Original Publication Date: 1982-Nov-01
Included in the Prior Art Database: 2005-Feb-10
Document File: 2 page(s) / 21K

Publishing Venue

IBM

Related People

Then, W: AUTHOR

Abstract

The apparatus comprises means for spinning the wafers and for directing jet streams of a liquid or gas onto the wafer surface.

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Apparatus for Cleaning and Drying Wafers

The apparatus comprises means for spinning the wafers and for directing jet streams of a liquid or gas onto the wafer surface.

As shown in the figure, housing 1 of the apparatus contains a horizontally arranged, star-shaped spinning plate with several points, the extreme ends of which are bent upwards. Spinning plate 2, which serves to support wafer 3, can be raised and lowered and is driven by paddle wheel 4. Two jets 5 are directed towards spinning plate 2 in such a manner that two dispersive overlapping jet streams 6 of a liquid or gas spray the whole surface of wafer 3 to be treated. A jet of water (not shown) propels paddle wheel 4.

The apparatus is used, for example, for lifting off aluminum from a wafer surface and for subsequently drying the wafer. In the first step, two jet streams of a liquid, such as water, are directed onto wafer 3 on spinning plate 2. Paddle wheel 4 is rotated at moderate speed. Wafer 3 is kept on spinning table 2 by the vacuum produced by the jet stream hitting rotating wafer 3. After the lift-off step, spinning table 2 is lowered and paddle wheel 4 is accelerated to a high rotational speed by applying a water stream to the paddles with an increased force. At the same time, two jet streams of nitrogen are directed onto the wafer surface through jets 5 until wafer 3 is dry.

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