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Browse Prior Art Database

LSI Mask Cleaning Apparatus

IP.com Disclosure Number: IPCOM000050682D
Original Publication Date: 1982-Dec-01
Included in the Prior Art Database: 2005-Feb-10
Document File: 2 page(s) / 33K

Publishing Venue

IBM

Related People

Rosenbluth, W: AUTHOR [+2]

Abstract

The LSI (large-scale integration) mask cleaning apparatus is shown in cross-sectional view in Fig. 1 and in an overall view in Fig. 2. The cleaning apparatus sweeps dust particles from the surface 1 of an LSI photolithographic mask, by moving the sweeping apparatus 2 across its surface. A plenum is formed by a first housing portion 3 and a second housing portion 4, forming a hollow chamber containing the cavities A and B which are separated by the modulated separator 8. The cavity A is supplied with a stream of nitrogen gas at a positive pressure from the pressure manifold 6, and the cavity B is evacuated through the vacuum manifold 7.

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LSI Mask Cleaning Apparatus

The LSI (large-scale integration) mask cleaning apparatus is shown in cross- sectional view in Fig. 1 and in an overall view in Fig. 2. The cleaning apparatus sweeps dust particles from the surface 1 of an LSI photolithographic mask, by moving the sweeping apparatus 2 across its surface. A plenum is formed by a first housing portion 3 and a second housing portion 4, forming a hollow chamber containing the cavities A and B which are separated by the modulated separator
8. The cavity A is supplied with a stream of nitrogen gas at a positive pressure from the pressure manifold 6, and the cavity B is evacuated through the vacuum manifold 7.

The sweeping operation takes place by directing a modulated nitrogen gas stream from the cavity A through the pressure orifice 5, across the surface 1 of the mask to be cleaned, and then through the vacuum orifice 5' into the evacuated chamber B. This pulsating nitrogen gas flow will serve to remove particles from the surface 1 of the mask. The modulated separator extends through the flexible seal 9 of the assembly and can be driven by means of an ultrasonic vibratory source.

The pulsating nitrogen gas stream will induce an alternate positive and negative pressure on the mask surface to be cleaned, which will tend to sweep contaminating particles from the surface of the mask toward and into the evacuated chamber B, thereby cleaning the mask in a superior manner.

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