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Improved Probe Composition for Spreading Resistance Apparatus

IP.com Disclosure Number: IPCOM000051025D
Original Publication Date: 1982-Dec-01
Included in the Prior Art Database: 2005-Feb-10
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Dupnock, A: AUTHOR [+4]

Abstract

Test probes formed of a specific tungsten carbon alloy when used in a spreading resistance apparatus to measure impurity concentration on an epitaxial surface insure long term reproducibility under manufacturing conditions.

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Improved Probe Composition for Spreading Resistance Apparatus

Test probes formed of a specific tungsten carbon alloy when used in a spreading resistance apparatus to measure impurity concentration on an epitaxial surface insure long term reproducibility under manufacturing conditions.

In a semiconductor manufacturing environment it is necessary to measure and to monitor the surface impurity concentration in an epitaxial layer deposited on a monocrystalline silicon substrate. Such measurements can be made with a spreading resistance apparatus, as disclosed in U.S. Patent 3,487,301. However, a great deal of difficulty has been experienced in maintaining reproducible measurements using conventional probe materials. Probe recalibrations are required on a daily basis and frequently on a shift basis, resulting in low tool utilization and impacting manufacturing production schedules.

This probe alloy consisting of 72 per cent tungsten carbide, 23 per cent ruthenium and 5 per cent cobalt insures long term reproducibility under normal production conditions.

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